production process of a superconducting thin film by mainly using physical evaporation
Note 1 to entry: The physical vapour deposition process mainly constitutes a thin film by using vacuum evaporation of atomic species or sputter deposition using single or multiple targets in inert or reactive atmospheres (e.g. RF-magnetron sputtering, ion beam sputtering, molecular beam epitaxy, laser ablation). Note 2 to entry: This note applies to the French language only. Note 3 to entry: This entry was numbered 815-14-13 in IEC 60050-815:2015.
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