IEVref:815-24-17ID:
Language:enStatus: Standard
Term: physical vapour deposition process
Synonym1: PVD process
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Definition: production process of a superconducting thin film by mainly using physical evaporation

Note 1 to entry: The physical vapour deposition process mainly constitutes a thin film by using vacuum evaporation of atomic species or sputter deposition using single or multiple targets in inert or reactive atmospheres (e.g. RF-magnetron sputtering, ion beam sputtering, molecular beam epitaxy, laser ablation).

Note 2 to entry: This note applies to the French language only.

Note 3 to entry: This entry was numbered 815-14-13 in IEC 60050-815:2015.


Publication date:2024-08
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