| production process of a film by involving chemical reactions of gases (vapours) that include the desired constituent atoms
Note 1 to entry: Organometallic or other compounds are transported at a relatively low temperature to the reaction area, using a carrier gas, where the products of the reaction are deposited on a substrate (e.g. MOCVD, halide CVD, plasma-enhanced CVD, laser-enhanced CVD). Note 2 to entry: This note applies to the French language only. Note 3 to entry: This entry was numbered 815-14-12 in IEC 60050-815:2015.
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