IEVref:523-05-14ID:
Language:enStatus: Standard
Term: inductively coupled plasma
Synonym1: ICP
[Preferred]
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Definition: high-density plasma generated by a high-intensity inductively coupled electromagnetic field

Note 1 to entry: Inductively coupled plasma is used in etching processes such as deep reactive ion etching.

Note 2 to entry: This note applies to the French language only.


Publication date:2018-12
Source IEC 62047-1:2016, 2.5.30, modified – In the definition, "inductive coupling" has been replaced by "a high-intensity inductively coupled electromagnetic field".
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